Name: 8/6/4/2Inch LPCVD lò oxy hóa tự động đầy đủ Kiểm soát oxy thấp
Uploaded: 2026-03-10CDT00:13:12-05:00
Duration: 46 s
Description: Discover the 8/6/4/2Inch LPCVD Oxidation Furnace, a fully automated system for thin film deposition with low oxygen control. Ideal for semiconductor manufacturing, it ensures excellent film uniformity and repeatability, supporting various oxidation, annealing, and LPCVD processes. Perfect for high-volume production with seamless MES integration.

Trò chuyện Liên hệ chúng tôi

8/6/4/2Inch LPCVD lò oxy hóa tự động đầy đủ Kiểm soát oxy thấp

Video khác

April 27, 2025

Trò chuyện Liên hệ chúng tôi

Mô tả video:

Discover the 8/6/4/2Inch LPCVD Oxidation Furnace, a fully automated system for thin film deposition with low oxygen control. Ideal for semiconductor manufacturing, it ensures excellent film uniformity and repeatability, supporting various oxidation, annealing, and LPCVD processes. Perfect for high-volume production with seamless MES integration.

Video liên quan